基于专利分析的AI芯片与光刻技术竞争态势分析
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Competitive Analysis of AI Chip and Photolithography Technologies Based on Patent Analysis
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    基于incoPat专利索引数据库,从年份、地域、申请单位以及专利价值度4个关键维度对全球AI芯片和光刻技术的竞争态势进行研究。结果表明:1990—2023年,全球AI芯片和光刻技术专利申请呈逐年上升趋势;中国AI芯片和光刻技术在专利申请和专利发明人来源中占据重要地位,但在申请单位分布和价值度方面,尚未跻身前列。中国在专利集中度和核心技术竞争力方面与国际先进水平存在差距,需加强专利布局和技术创新,以提升在全球竞争中的地位。

    Abstract:

    Based on the incoPat patent index database, a study was conducted on the global competition landscape of AI chips and lithography technology, focusing on four key dimensions: year, region, applicant, and patent value. The results indicate that from 1990 to 2023, patent applications for global AI chips and lithography technologies have been rising annually. China plays a significant role in terms of patent applications and the sources of patent inventors for AI chips and lithography technology. However, in terms of applicant distribution and patent value, it has not yet ranked among the leaders. There is a gap between China and the international advanced level in patent concentration and core technological competitiveness. In order to improve its position in global competition, it is suggested to strengthen its patent strategy and technological innovation.

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王佳怡,翟羽涵,黎诚劼,吕拉昌.基于专利分析的AI芯片与光刻技术竞争态势分析[J].科技与产业,2025,25(11):289-299

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  • 在线发布日期: 2025-06-18
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