Lithography machines are core equipments for manufacturing integrated circuits (IC) and strategic products of high-tech powers. They are also the main battlefield and game focus of current technological competition internationally. At present, the global high-level lithography machines market has been monopolized by the Dutch ASML, and it has a strict and worldwide intellectual property layout in this field. As a latecomer to the market, the intellectual property construction about the domestic lithography machines started late and does not occupy an advantageous position. Through the comprehensive analysis of patent litigation cases between the two major giants ASML and Nikon in the field of lithography internationally that occurred in different stages during the development of their products, this paper explore the strategies and techniques commonly used by international industry giants in intellectual property litigation for technology-intensive industries as integrated circuits (or semiconductors), and then gain some important inspirations for the intellectual property construction of domestic lithography equipment.